Sputtering Targets

Morgan Technical Ceramics are specialists in the manufacture of ceramic sputtering targets for the Semiconductor Industry manufactured from 94%-99.99% alumina and Chemical Vapor Deposition (CVD) Silicon Carbide (SiC) for Physical Vapour Deposition (PVD) applications.

Our alumina sputtering targets are suited to a variety of applications including wear coatings, dielectric coatings and barrier coatings, whereas our CVD SiC sputtering targets are an excellent choice for the deposition of high-purity SiC thin films for demanding applications such as the manufacture of magnetic disk drive heads.

Features of Ceramic Sputtering Targets

• Controlled microstructures
• Very high purity, consistency, and uniformity
• Thermal conductivity that is twice that of sintered SiC
• Highly resistant to thermal shock
  
  

Benefits of Ceramic Sputtering Targets 

• Sizes to one meter
• High tolerance ceramic machining/polishing
• Near net shape processing